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Titanium sputtering target is a kind of titanium product with a thin sputter coating film. The Purity is the key point for the performance of the titanium sputter coating, the higher the purity is, the better the corrosion resistance and electrical and optical properties of the titanium sputtered film. The titanium targets have a wide application for semiconductor devices(deposited film oxidized to TiO2 as a beam splitter or insulator), architecture glass, PV/Solar, Decoration, Optics, PVD coating applications. At energy titanium, we provide casting or forging titanium targets, made of titanium bar or plate and finally CNC machine, helping to increase functionality in a wide range of coating applications. Our targets are produced by high purity titanium with fine and uniform structure, committed in the low particle size in its entire service life.

Titanium Targets Specification

With the rapid development of semiconductors, electronic information and other high-tech fields, the amount of high purity titanium in target materials is increasing. Titanium targets made by sputtering coating technologies have the higher purity and smaller possible average grain sizes for use in semiconductor, electronic information, physical vapor deposition (PVD) display, chemical vapor deposition (CVD) and optical applications.

Semiconductor applications sector:

• Flat Panel Display
• Integrated Circuits

Energy-Ti specializes in producing high purity Titanium sputtering targets for the semiconductor and electronic information industry with the shape of plate, disc and tubing. If you feel interested in the titanium products, you can can also contact us via [email protected] or directly send us an inquiry.